東北大学 末光・吹留研究室の発表論文をご紹介

2011年発表論文

Transmission Electron Microscopy and Raman-Scattering Spectroscopy Observation on the Interface Structure of Graphene Formed on Si Substrates with Various Orientations

Japanese Journal of Applied Physics,50(4),(2011)

H. Handa, R. Takahashi, S. Abe, K. Imaizumi, E. Saito, M.H. Jung, S. Ito, H. Fukidome and M. Suemitsu

Temperature-Programmed Desorption Observation of Graphene-on-ilicon Process

Japanese Journal of Applied Physics,50(7),(2011),70102-1-70102-5

Shunsuke Abe, Hiroyuki Handa, Ryota Takahashi, Kei Imaizumi, Hirokazu Fukidome , and Maki Suemitsu

Low-Energy-Electron-Diffraction and X-ray-Phototelectron -Spectroscopy Studies of Graphitization of 3C-SiC(111) Thin Film on Si(111) Substrate

Japanese Journal of Applied Physics,50(7),(2011),70103-1-70103-6

Ryota Takahashi, Hiroyuki Handa, Shunsuke Abe, Kei Imaizumi, Hirokazu Fukidome, Akitaka Yoshigoe, Yuden Teraoka, and Maki Suemitsu

Oxygen-Induced Reduction of the Graphitization Temperature of SiC Surface

Japanese Journal of Applied Physics,50(7),(2011),70105-1-70105-6

Kei Imaizumi, Hiroyuki Handa, Ryota Takahashi, Eiji Saito, Hirokazu Fukidome, Yoshiharu Enta, Yuden Teraoka, Akitaka Yoshigoe, and Maki Suemitsu

Polymer Material as a Gate Dielectric for Graphene Field-Effect-Transistor Applications

Japanese Journal of Applied Physics,50(7),(2011),70107-1-70107-5

Myung-Ho Jung, Hiroyuki Handa, Ryota Takahashi, Hirokazu Fukidome, Tetsuya Suemitsu, Taiichi Otsuji, and Maki Suemitsu

Investigation of Graphene Field Effect Transistors with Al2O3 Gate Dielectrics Formed by Metal Oxidation

Japanese Journal of Applied Physics,50(7),(2011),70111-1-70111-5

Myung-Ho Jung, Hiroyuki Handa, Ryota Takahashi, Hirokazu Fukidome, Tetsuya Suemitsu, Taiichi Otsuji, and Maki Suemitsu

Room Temperature Logic Inverter on Epitaxial Graphene-on-Silicon Device

Japanese Journal of Applied Physics,50(7),(2011),70113-1-70113-4

Amine El Moutaouakil, Hyun-Chul Kang, Hiroyuki Handa, Hirokazu Fukidome, Tetsuya Suemitsu, Eiichi Sano, Maki Suemitsu, and Taiichi Otsuji

Formation of epitaxial graphene on silicon substrates and control of their stacking properties

Graphene Week 2011: Fundamental Science of Graphene and Applications of Graphene-Based Devices,(2011)

Suemitsu Maki

Complimentary logic inverter on epitaxial graphene/6H-SiC field effect transistor with diamond-like carbon film as gate dielectrics at room temperature

nature Graphene Conference,(2011)

Amine El Moutaouakil, Susumu Takabayashi, Shuichi Ogawa, Yuji Takakuwa, Hyun-Chul Kang, Ryota Takahashi, Hirokazu Fukidome, Maki Suemitsu, Eiichi Sano, Tetsuya Suemitsu, Taiichi Otsuji

XTEM characterization of epitaxial graphene formed on non-basal SiC surfaces

International Conference on New Diamond and Nano Carbons2011,(2011)

M Suemitsu, H Handa, F Hirokazu

Mechanical and tribological properties of silicon- andnitrogen-incorporated diamond-like carbon films by plasma-enhanced chemical vapor deposition

International Conference on New Diamond and Nano Carbons2011,(2011)

H Nakazawa, S Miura, R Kamata, S Okuno, Y Enta, M Suemitsu, T Abe

Graphene FETs with SiCN gate stack deposited by PECVD using HMDS vapor

35th Workshop on Compound Semiconductor Devices and Integrated Circuits,(2011)

Tetsuya Suemitsu

Growth of epitaxial graphene on 3C-SiC/Si heterostructure

HeteroSiC-WASMPE2011,(2011)

Maki Sue, Hirokazu Fukidome

Charging effects in silicon nanocrystals embedded in silicon oxycarbide film

International Forum on Functional Materials (IFFM2011),(2011)

Tae-Youb Kim, Soon-Won Jung, Nae-Man Park, In-Kyu You and Maki Suemitsu

Tuning of Structural and Electronic properties of Epitaxial Graphene by Substrate Microfabrication

2011 International Conference on Solid State Devices and Materials (SSDM2011),(2011)

H.Fukidome, H.Handa, M.Kotsugi, Th.Seyller, Y.Kawai, T.Ohkouchi, K.Horn, R.Takahashi, K.Imaizumi, Y.Enta, M.Suemitsu, T.Kinoshita

Graphene/SiC/Si FETs with SiCN Gate Stack

the 220th ECS Meeting & Electrochemical Energy Summit,(2011)

T. Suemitsu, M. Kubo, H. Handa, R. Takahashi, H. Fukidome, M. Suemitsu, and T. Otsuj

Tunable electronic structure of epitaxial graphene formed on silicon substrates

Nano-S&T 2011,(2011)

M Suemitsu

Tuning of Electronic Properties of Epitaxial Graphene on Microfabrication

第24回マイクロプロセス・ナノテクノロジー国際会議(MNC 2011),(2011)

H. Fukidome, H. Handa, M. Kotsugi, T.Seyller, Y. Kawai, T. Ohkouchi, K. Horn, R.Takahashi, K. Imaizumi, Y. Enta, M. Suemitsu and T. Kinoshita

Effect of SiH4 Pre-annealing on Graphitization of 3C-SiC/Si

第24回マイクロプロセス・ナノテクノロジー国際会議(MNC 2011),(2011)

H. Fukidome, S. Abe, H. Handa, R.Takahashi, K. Imaizumi, S. Sanbonsuge and M. Suemitsu

Impacts of the Access Resistance on the Channel Conduction Characteristics in Graphene FETs

第24回マイクロプロセス・ナノテクノロジー国際会議(MNC 2011),(2011)

M.-H. Jung, C. Quan, H. Fukidome, T.Suemitsu, T. Otsuji and M. Suemitsu

Radio frequency rectifiers based on flexible InGaZnO TFT

Interncational Conference on Advanced Electromaterials 2011,(2011)

Tae-Youb Kim, Soon-Won Jung, Jae Bon Koo, Yong Suk Yang, Su Jae Lee, Woo-Seok Cheong, In-Kyu You, Maki Suemitsu

Graphene in electronics: current status and future outlook

Internationa Display Workshops(IDW'11),(2011)

Maki Suemitsu

Epitaxial growth of graphene on 3C-SiC thin film formed on Si substrates

International Symposium on Surface Science(ISSS-6),(2011)

Maki Suemitsu

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